Contact
How to shop
Delivery
Shopping guide
DUV-resist stripping with ozonated water in semiconductor industry
English
172 b
Up to 30 days for returns
Customers also purchased
/
Paperback
31.96
€
/
Paperback
31.96
€
/
Paperback
42.31
€
/
Paperback
17.08
€
/
Paperback
60.21
€
The ongoing miniaturisation in the semiconductor industry places many major challenges for materials as well as the process design. A very important step is the residue-free and gentle stripping of photo-resists. The standard process is a sequence of plasma etching and wet chemical cleaning. Hence, with actual structures of 32 nm and new materials for high- and low-k dielectrics, the aggressive plasma etching has come to its limits. For the future it is thus essential to find a non-destructive wet cleaning method. Such alternatives already exist originated from the standard SPM, modified to SOM and finally to ozonated water. This chemistry not only is cost efficient and eco-friendly, it has also proven its feasibility with i-line resists. The challenge now is to adapt this chemistry to currently applied DUV-resists which essentially differ in their structures. All-important is to find a way to remove the crust generated on the resists during implantation steps, being impossible by wet chemistry yet. The eventual purpose of this work is to achieve an understanding of all the parameters involved, in order to be able to design individual solutions for each resist and process step.
About the book
English
Categories
Give this book today
It's easy
1 Add to cart and choose Deliver as present at the checkout 2 We'll send you a voucher 3 The book will arrive at the recipient's addressYou might also be interested in
/
Paperback
14.67
€
/
Paperback
27.54
€
/
Paperback
12.96
€
/
Paperback
6.32
€
Hi! I'm Libroamiko, your book advisor.
How can I help you?