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Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications

Jezik EngleskiEngleski
Knjiga Tvrdi uvez
Knjiga Atomic Layer Deposition Tommi Kaariainen
Libristo kod: 04949772
Nakladnici John Wiley & Sons Inc, lipanj 2013
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf... Cijeli opis
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Informacije o knjizi

Puni naziv Atomic Layer Deposition
Autor Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman
Jezik Engleski
Uvez Knjiga - Tvrdi uvez
Datum izdanja 2013
Broj stranica 272
EAN 9781118062777
ISBN 1118062779
Libristo kod 04949772
Nakladnici John Wiley & Sons Inc
Težina 582
Dimenzije 240 x 164 x 25

Kategorija

Technology, Engineering, Agriculture > Mechanical engineering & materials > Materials science > Engineering applications of surface coatings & films
Technology, Engineering, Agriculture > Electronics & communications engineering > Electronics engineering > Electronic devices & materials
Technology, Engineering, Agriculture > Technology: general issues > Nanotechnology
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